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Hot filament HFCVD diamond deposition device

Hot wire chemical vapor deposition (HOT FILAMENT CHEMICAL,VAPOR DEPOSITION,HFCVD) technology is one of the commonly used diamond film deposition technology, with simple equipment, convenient operation, low cost, suitable for large area, complex shape tool diamond coating deposition and other advantages.

Key words: standard leak | MPCVD | capacitance film gauge vacuum gauge | high and low vacuum calibration device | helium leak calibration device

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Product Details

Product Introduction
Hot wire chemical vapor deposition (HOT FILAMENT CHEMICAL,VAPOR DEPOSITION,HFCVD) technology is one of the commonly used diamond film deposition technology, with simple equipment, convenient operation, low cost, suitable for large area, complex shape tool diamond coating deposition and other advantages. The HFCVD equipment designed and manufactured by our company is a special equipment for depositing diamond film on cemented carbide tool substrate. The equipment has two control functions of manual/automatic, and can meet the requirements of various complex deposition diamond coating processes through man-machine interface operation.

 

Technical parameters

HF350

HF450

HF550

Reaction chamber size

Ф 350 x 420mm

Reaction chamber size

Ф 450 x 450mm

Reaction chamber size

Ф 550 x 550mm

Lifting stroke of reaction chamber

 350mm

Lifting stroke of reaction chamber

350mm

Lifting stroke of reaction chamber

350mm

Table size

  200x100x80mm

Table size

220 × 220mm

Table size

φ300mm

300 × 300mm

Table lifting stroke

£90 mm

Table lifting stroke

£90 mm

Table lifting stroke

£90 mm

Adjusting range of working air pressure

1000-10000 Pa (±5%)

Adjusting range of working air pressure

1000-10000 Pa (±5%)

Adjusting range of working air pressure

1000-10000 Pa (±5%)

Reaction chamber limit vacuum

≤ 3 Pa

Reaction chamber limit vacuum

≤ 3 Pa

Reaction chamber limit vacuum

≤ 3 Pa

Pressure holding capacity of reaction chamber

≤ 50 Pa/hrs

Pressure holding capacity of reaction chamber

≤ 50 Pa/hrs

Pressure holding capacity of reaction chamber

≤ 50 Pa/hrs

Four-way mass flow meter gas distribution

Hydrogen, methane, nitrogen, argon

Four-way mass flow meter gas distribution

Hydrogen, methane, nitrogen, argon

Four-way mass flow meter gas distribution

Hydrogen, methane, nitrogen, argon

Hot wire heating power

10 kW

Hot wire heating power

20 kW

Hot wire heating power

30 kW

Total power of equipment

15 kW

Total power of equipment

25 kW

Total power of equipment

36 kW

DC bias (optional)

0-100V (customizable)

DC bias (optional)

0-100V (customizable)

DC bias (optional)

0-100V (customizable)

DC bias current (optional)

0-5A (customizable)

DC bias current (optional)

0-5A (customizable)

DC bias current (optional)

0-5A (customizable)

substrate temperature

500-1300°C

substrate temperature

500-1300°C

substrate temperature

500-1300°C

 

Main features
1. The equipment has an elastic wire drawing and a counterweight hammer wire drawing mechanism, which can keep the hot wire straight and not bent at the highest hot wire temperature (about 2300°C);
2. Supporting programmable process parameters can ensure the stability of diamond film deposition rate, and can meet all kinds of high-quality diamond film deposition, including micron diamond film, nano diamond film and micro nano multilayer composite film, etc;
3. The overall structure of the equipment has been optimized to meet the uniform deposition of diamond films on the surface of different shapes of substrates, and can be used for the batch production of diamond film-coated tools, heat sinks and ceramic metal sealing rings;
The bell jar, chassis, workbench and reaction chamber are all water-cooled to avoid overheating, and are equipped with safety interlocking and protection devices to ensure the safe operation of the equipment.

Function
1. It can realize the automatic production and uniform deposition of high-quality diamond films on the surface of complex shaped cemented carbide substrates.
2. The adjustable pressure range of the vacuum reaction chamber can meet the requirements of various types of diamond film deposition, and the pressure range can be adjusted linearly from 1000 to 10000 Pa.
3. A water-cooled workbench is adopted, and the workbench can be raised and lowered under the conditions of opening the reaction chamber and operating the equipment. After the tool is loaded into the fixture, it is convenient to move as a whole without falling out, and it is stably fixed after being put into the sample table.
4. Tantalum wire is used as the heat source, high temperature resistant hot wire clamping and tensioning device, spring wire drawing mechanism and counterweight hammer wire drawing mechanism are used to ensure that the hot wire is straight and does not bend and sag during deposition. The hot wire temperature can reach 2200°C, the substrate temperature can be measured, and the abnormal working state of the hot wire has alarm function. The distance between the substrate and the hot wire can be freely adjusted according to the requirements of diamond film deposition.
5. The bell-jar type reaction chamber is of jacket type with observation window on the side. The jacket and chassis of the reaction chamber are water-cooled. The air inlet and outlet of the chassis ensure air tightness and can withstand high temperature in the deposition process. Using high-performance vacuum pump exhaust system, can ensure the stability of the reaction pressure, no gas leakage.
6. The water cooling circuit includes the total water inlet and outlet, and the water supply of each branch is smooth.
7. With vacuum, pressure, water pressure, dangerous gas leakage, heating safety interlock and protection device and the corresponding alarm system, can ensure the safe operation of the equipment; furnace cavity up, down, deflation key, using physical key and virtual key.
8.4-way gas distribution system, hydrogen, methane, argon and nitrogen respectively, adopts imported mass flowmeter to control the flow. (Optional to increase gas flow and liquid doping flow)
9. The gas is introduced from the top of the bell, and the gas outlet is below the workbench to ensure the uniformity of gas distribution in the reaction chamber.
10. The control parameters in HFCVD deposition equipment are measured by corresponding sensors, and the measured signal data are A/D converted and transmitted to the industrial control computer, and the data are collected, displayed, and calculated to obtain the detection signal data. The function of automatic process data storage is realized, and the data storage capacity reaches 1 year.

 

Advantages:

Simple operation, fully automated control

Provide production fixtures to meet user needs

Provide supporting production process

Lifelong technical support

One-stop solution

 

Equipment features
Fully automatic industrial control interface, support remote control. One-button switch, unattended. Automatic non-contact far infrared temperature measurement. Selection of precision DC power supply, waterway full monitoring. Selection of high-efficiency direct-coupled rotary vane pump.

 

Application
Diamond coated tools can be applied to high-speed machining, because in addition to the excellent mechanical properties of diamond coated tools, diamond coating process can prepare any complex shape milling cutter for high-speed machining such as aluminum, titanium alloy, aviation materials and difficult to process non-metallic materials such as graphite electrodes;

 

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