MPCVD single crystal diamond growth machine equipment
Key words: standard leak | MPCVD | capacitance film gauge vacuum gauge | high and low vacuum calibration device | helium leak calibration device
Classification:
Product Details
microwave plasma chemical vapor deposition
Microwave Plasma CVD system
Microwave plasma chemical vapor deposition (Microwave Plasma Chemical Vapor Deposition) is the preferred method for the preparation of diamond with high efficiency and high quality, which breaks the limitation of equipment on substrate size and provides conditions for the growth of large area single crystal diamond.
MPCVD single crystal diamond growth technology generally uses metal cavity, because of its microwave energy pollution-free, pure gas raw materials, no catalyst and impurity doping and other advantages, the quality of diamond has been improved, and it has become one of the most promising technologies for the development of high quality single crystal diamond, which greatly expands the application potential of diamond materials in the field of high-tech.
Equipment features
• Fully automatic industrial control interface, support remote control.
• One-button switch, unattended.
• Automatic non-contact far-infrared temperature measurement.
• Selection of imported microwave and full monitoring of waterway.
• Optional oil-free vacuum pump plus molecular pump.
• High-precision gas mass flow meter, high reliability and stable pressure control system.
• The response is controllable and can work stably for a long time at 6KW
High-power high-density plasma is stabilized at a certain position away from the quartz window to reduce silicon pollution
Application
• Highly efficient thermal conductive materials.
• New semiconductor materials.
• New cutting tools, molds, abrasives.
• Artificial cultivation of diamonds.
• Optical Lenses
• Quantum sensors/NV color center quantum devices
• Nano-diamond materials
• Fourth Generation Semiconductor Materials
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Project Name |
Standard configuration |
Optional configuration |
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microwave source |
SAIRREM/MUEGGE |
|
|
pyrometer |
SA-D30160A |
Williamson |
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Evacuation equipment |
DRV-16 |
DRV-16 FF150 |
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ultimate vacuum |
≤ 5E-1Pa |
≤ 5E-5Pa |
|
Input gas |
4-way standard growth gas |
Customizable multi-way mixing and doping gases |
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Table size |
60mm |
|
|
Pressure control range |
500~50000 Pa |
|
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Industrial control interface |
Industrial computer automatic control with remote operation monitoring |
|
|
Overall leakage rate of equipment |
Better than 1E-12Pa · m3/s |
|
|
Equipment size |
1500*850*1700 |
|
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Equipment weight |
500kg |
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